Coating apparatus – With cutting – punching or tearing of work – Web or sheet work
Patent
1974-12-12
1977-01-04
Kaplan, Morris
Coating apparatus
With cutting, punching or tearing of work
Web or sheet work
C23C 1308
Patent
active
040007170
ABSTRACT:
The disclosure relates to apparatus for the deposition of epitaxial (semiconductor) layers by the vapor phase epitaxial growth technique wherein the carrousel for carrying substrate (semiconductor) slices onto which epitaxial deposition is to take place is arranged whereby, in accordance with the first embodiment, the slices are placed in compartments in the carrousel, the gases passing over the substrates in each of the compartments without then passing onto other compartments to prevent contamination between substrates and from the effluent gases provided after deposition on one of the substrates. This provides a decrease in cross-contamination and an increase in the packing density of substrates onto which epitaxial deposition is to take place.
In accordance with the second embodiment of the disclosure, a cellular-structured carrousel is provided, the circumferential side of the radially formed compartments being opened, thereby providing a minimal amount of gas phase cross-contamination between compartments.
REFERENCES:
patent: 3727620 (1973-04-01), Orr
patent: 3931789 (1976-01-01), Kakei et al.
Anderson Philip Leroy
Gartman William Wesley
Comfort James T.
Honeycutt Gary C.
Kaplan Morris
Levine Harold
Texas Instruments Incorporated
LandOfFree
Apparatus for epitaxial deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for epitaxial deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for epitaxial deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-248115