Apparatus for epitaxial deposition

Coating apparatus – With cutting – punching or tearing of work – Web or sheet work

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C23C 1308

Patent

active

040007170

ABSTRACT:
The disclosure relates to apparatus for the deposition of epitaxial (semiconductor) layers by the vapor phase epitaxial growth technique wherein the carrousel for carrying substrate (semiconductor) slices onto which epitaxial deposition is to take place is arranged whereby, in accordance with the first embodiment, the slices are placed in compartments in the carrousel, the gases passing over the substrates in each of the compartments without then passing onto other compartments to prevent contamination between substrates and from the effluent gases provided after deposition on one of the substrates. This provides a decrease in cross-contamination and an increase in the packing density of substrates onto which epitaxial deposition is to take place.
In accordance with the second embodiment of the disclosure, a cellular-structured carrousel is provided, the circumferential side of the radially formed compartments being opened, thereby providing a minimal amount of gas phase cross-contamination between compartments.

REFERENCES:
patent: 3727620 (1973-04-01), Orr
patent: 3931789 (1976-01-01), Kakei et al.

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