Apparatus for electron beam physical vapor deposition

Details Apparatus for electron beam physical vapor deposition Apparatus for electron beam physical vapor deposition

1998-12-11

2000-11-14

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723FE, 21912112, 2504923, C23F 102

Patent

active

061454702

ABSTRACT:
An apparatus for depositing a ceramic coating by electron beam physical vapor deposition (EBPVD). Ceramic coatings of more uniform thickness over a larger surface area are deposited by increasing the size of a pool of molten ceramic from which the ceramic is deposited. The apparatus uses a crucible that surrounds a ceramic material that serves as the source of the deposited ceramic coating. The crucible is configured to define a reservoir whose cross-sectional area is larger than the cross-sectional area of the ceramic material. The size of the pool is increased by increasing the size of the reservoir in lieu of increasing the diameter of the ceramic material in order to maintain acceptable ingot quality.

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patent: 5418003 (1995-05-01), Bruce et al.
patent: 5792521 (1998-08-01), Wortman

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