Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1982-04-14
1984-09-04
Tung, T.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204269, 204270, 204275, 204278, 204 95, C25B 900
Patent
active
044695764
ABSTRACT:
Disclosed is an improved process for electrolytically producing alkaline chlorate, carried out at an increased temperature by using an apparatus of a column type. The apparatus has a lower electrolysis zone, an intermediate reaction zone and an upper hydrogen-separation zone. The reaction zone has a central hollow section and a circumferential hollow section surrounding the central section. A solution to be electrolyzed is forced to circulate through the three zones by hydrogen gas generated so that the solution is allowed to flow down through the circumferential hollow section in a piston-flow manner after the hydrogen gas is separated from the solution. While the solution is passing through the circumferential section, effective auto-oxidation of hypochlorous acid is attained thereby causing the current efficiency of the electrolysis to be improved.
REFERENCES:
patent: 3234117 (1966-02-01), Rost et al.
patent: 3647672 (1972-03-01), Mehandjien
patent: 3732153 (1973-05-01), Harket et al.
patent: 3756933 (1973-09-01), Greenberg
patent: 3775283 (1973-11-01), Eisele et al.
patent: 4032426 (1977-06-01), de Nora et al.
patent: 4046653 (1977-09-01), de Nora et al.
patent: 4332648 (1982-06-01), Spore
patent: 4332659 (1982-06-01), Spore
Akazawa Toshitada
Haga Toshikatu
Suzuki Kohkichi
Hodogaya Chemical Company, Ltd.
Miller Austin R.
Tung T.
LandOfFree
Apparatus for electrolytical production of alkaline chlorate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for electrolytical production of alkaline chlorate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for electrolytical production of alkaline chlorate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1891035