Apparatus for electrochemically depositing a material onto a...

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C204S22400M, C204S22400M

Reexamination Certificate

active

07033464

ABSTRACT:
A multi-process workpiece apparatus is disclosed. The multi-process workpiece apparatus includes an electrochemical deposition apparatus which has a wafer contacting surface having at least one electrical conductor disposed therein. The multi-process workpiece apparatus also includes a planarization apparatus and at least one workpiece handling robot configured to transport a workpiece from the electrochemical deposition apparatus to the planarization apparatus.

REFERENCES:
patent: 3779887 (1973-12-01), Gildone
patent: 4713149 (1987-12-01), Hoshino
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 5081421 (1992-01-01), Miller et al.
patent: 5492594 (1996-02-01), Burke et al.
patent: 5723387 (1998-03-01), Chen
patent: 5807165 (1998-09-01), Uzoh et al.
patent: 5911619 (1999-06-01), Uzoh et al.
patent: 6004880 (1999-12-01), Liu et al.
patent: 6017437 (2000-01-01), Ting et al.
patent: 6066030 (2000-05-01), Uzoh
patent: 6090239 (2000-07-01), Liu et al.
patent: 6110011 (2000-08-01), Somekh et al.
patent: 6121152 (2000-09-01), Adams et al.
patent: 6132586 (2000-10-01), Adams et al.
patent: 6143155 (2000-11-01), Adams et al.
patent: 6171467 (2001-01-01), Weihs et al.
patent: 6176992 (2001-01-01), Talieh
patent: 6197181 (2001-03-01), Chen
patent: 6251236 (2001-06-01), Stevens
patent: 6258223 (2001-07-01), Cheung et al.
patent: 6294059 (2001-09-01), Hongo et al.
patent: 6328872 (2001-12-01), Talieh et al.
patent: 6423636 (2002-07-01), Dordi et al.
patent: 6482307 (2002-11-01), Ashjaee et al.
patent: 6613200 (2003-09-01), Li et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for electrochemically depositing a material onto a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for electrochemically depositing a material onto a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for electrochemically depositing a material onto a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3576214

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.