Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-08-30
2000-01-04
Dang, Thi
Coating apparatus
Gas or vapor deposition
With treating means
20429841, C23C 1400
Patent
active
060098295
ABSTRACT:
An apparatus for applying material by cathodic arc vapor deposition to a substrate is provided which includes a vessel, apparatus for maintaining a vacuum in the vessel, a disk-shaped cathode, apparatus for selectively sustaining an arc of electrical energy between the cathode and an anode, and apparatus for driving the arc around an axially extending evaporative surface of the cathode. The apparatus for driving the arc includes a magnetic field generator attached to a ferromagnetic center piece. The magnetic field generator includes a plurality of side magnets attached to the ferromagnetic center piece, and a center magnet positioned radially inside of the side magnets. Each side magnet produces a magnetic field that permeates the cathode, and each magnetic field includes a portion that runs substantially parallel to the evaporative surface. The center magnet influences the axial position of the arc path relative to the evaporative surface.
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Randhawa, H. and Johnson, P.C. "Technical Note: A Review of Cathodic Arc Plasma Deposition Processes and Their Applications." Surface and Coatings Technology, 31 (1987), pp. 303-318. Elsevier Sequoia.
Dang Thi
Getz Richard D.
United Technologies Corporation
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