Apparatus for drawing paste pattern on substrate

Details Apparatus for drawing paste pattern on substrate Apparatus for drawing paste pattern on substrate

1992-07-24

1995-08-01

Simmons, David A.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to attribute, absence or presence of work

118668, 118680, 118712, 156356, B05C 1100, B05B 1510

Patent

active

054377277

ABSTRACT:
An apparatus for drawing a pattern of a photoresist on a substrate has a nozzle for discharging the paste and a substrate-supporting table movable along the X and Y-axes relative to the paste drawing opening of the nozzle. The nozzle is fixed to a Z-axis table which carries an optical displacement meter which measures the clearance between the substrate and the paste discharging opening. According to the results of the measurements, the Z-axis table is moved toward and away from the substrate so that the clearance is maintained at a desired distance. The optical displacement meter has a measuring point on the substrate. The measuring point is positioned so as not to interfere with the paste line which is drawn on the substrate with paste discharged from the nozzle.

REFERENCES:
patent: 4291642 (1981-09-01), Kolc
patent: 4728378 (1988-03-01), Bianchi
patent: 4762578 (1988-08-01), Burgin, Jr. et al.
patent: 4972798 (1990-11-01), Ando et al.
patent: 5052338 (1991-08-01), Maiorca et al.

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