Gas and liquid contact apparatus – Contact devices – Injector type
Patent
1982-07-27
1984-08-21
Chiesa, Richard L.
Gas and liquid contact apparatus
Contact devices
Injector type
210170, 2102212, 261123, 261DIG27, 261DIG75, B01F 304
Patent
active
044669283
ABSTRACT:
A treatment system for liquids includes apparatus for dissolving gas in the liquid and a container for providing the necessary reaction time between the gas and liquid or constituents thereof. The device for dissolving the gas in the liquid includes gas injection means for introducing gas into the liquid and a contact chamber for containing a downflowing stream of the liquid to be treated. The pressure within the downflowing stream increases as it descends and at the elevated pressure the capacity of the liquid to take gas into solution is greatly increased. This apparatus for dissolving gas may conveniently be located below ground level. A conduit return means is provided for routing undissolved gas from a region at high pressure to an upstream portion of the liquid stream so that the gas can be reintroduced for dissolution.
REFERENCES:
patent: 543411 (1895-07-01), Taylor
patent: 2633344 (1953-03-01), Rekk
patent: 3643403 (1972-02-01), Speece
patent: 3662890 (1972-05-01), Grimshaw
patent: 3761065 (1973-09-01), Rich et al.
patent: 3826742 (1974-07-01), Kirk et al.
patent: 3840216 (1974-10-01), Smith et al.
patent: 4000227 (1976-12-01), Garrett
patent: 4043771 (1977-08-01), Anand
patent: 4060574 (1977-11-01), Verner et al.
ICI, "The ICI Deep Shaft Effluent Treatment Process", ICI Limited, Cleveland, Sep., 1965.
Chiesa Richard L.
Dorr-Oliver Incorporated
Kearns Burtsell J.
Snyder Harold M.
LandOfFree
Apparatus for dissolution of gases in liquid does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for dissolution of gases in liquid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for dissolution of gases in liquid will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1937102