Apparatus for diffusion into semiconductor wafers

Details Apparatus for diffusion into semiconductor wafers Apparatus for diffusion into semiconductor wafers

1976-04-05

1978-12-12

Stein, Mervin

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

148189, 432253, C23C 1308

Patent

active

041290909

ABSTRACT:
In diffusing an impurity into semiconductor wafers within a silica tube by the use of a heating furnace, a method of diffusion involves the following steps: the semiconductor wafers are inserted into the tube from an inlet thereof, the inlet is sealed by a cap, the interior of the tube is placed under vacuum, and an atmosphere of the impurity is formed. Since, at heating, the tube is closed and no inert gas is fed thereinto, the temperature distribution within the tube is held uniform, and hence the quantities of impurity introduction into the semiconductor wafers are not varied.

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patent: 3826377 (1974-07-01), Bachmann
patent: 3852128 (1974-12-01), Kreuzer

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