Apparatus for detecting positions of marks in projection aligner

Details Apparatus for detecting positions of marks in projection aligner Apparatus for detecting positions of marks in projection aligner

1995-03-28

1996-01-09

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1100

Patent

active

054833493

ABSTRACT:
An apparatus for detecting positions is provided with an auxiliary pattern adjacent to the opaque portion of an index pattern, which has a spatial frequency higher than the insulating spatial frequency of an imaging system in order to obtain a stable signal portion (slope). Using this slope, the positional information of the index pattern is obtained, and on the basis of the positional information, the positions of wafer alignment marks are detected.

REFERENCES:
patent: 4679942 (1987-07-01), Suwa et al.

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