Apparatus for detecting position of an object such as a semicond

Details Apparatus for detecting position of an object such as a semicond Apparatus for detecting position of an object such as a semicond

1987-05-18

1988-09-13

Evans, F. L.

Optics: measuring and testing

By polarized light examination

With light attenuation

350401, G01B 1100

Patent

active

047705337

ABSTRACT:
An apparatus for detecting a position of a semiconductor wafer comprises a linear alignment mark formed on a surface of the wafer along a pair of parallel straight lines extending in a given direction intersecting a radial direction of the wafer. The alignment mark includes at least two projection sections projected from the surface and spaced from each other in the given direction. Each of the projection sections has a first stepped edge provided on or along one of the pairs of straight lines and a second stepped edge provided on and along the other of the pair of straight lines, the pair of straight lines being separated from each other by a distance d', and each of the projection sections being defined such that the following relationship is satisfied:

REFERENCES:
patent: 4200395 (1980-04-01), Smith et al.
patent: 4311389 (1982-01-01), Fay et al.

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