Apparatus for detecting defects using multiple coordinate...

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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C356S237300, C356S073000

Reexamination Certificate

active

08045149

ABSTRACT:
An apparatus is disclosed for detecting defects on a sample inspected by different inspection apparatuses. A data processing unit receives position information of a first defects group in a first coordinate system, based on inspection of the sample under a first condition using a first defect inspection apparatus. The data processing unit receives position information of a second defects group in a second coordinate system, after least one processing step has been performed on the sample. Position information of the second defects group is obtained by inspecting the sample under a second condition using a second defect inspection apparatus which is different from the first defect inspection apparatus. A position correction unit corrects error of relative position information on the first defects group and the second defects group, and the first and second defects groups are checked.

REFERENCES:
patent: 6028664 (2000-02-01), Cheng et al.
patent: 6320655 (2001-11-01), Matsushita et al.
patent: 7034298 (2006-04-01), Miyai et al.
patent: 2005/0094136 (2005-05-01), Xu et al.
patent: 2000-057501 (2000-02-01), None
patent: 2004-170092 (2004-06-01), None
S. Kaneko, et al. “Robust ICP Registration Algorithm Extended by M-estimation”, The Japan Society of Precision Engineering, vol. 67, No. 8, pp. 1-5, 2001.

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