Apparatus for detecting contaminants on the reticle of exposure

Details Apparatus for detecting contaminants on the reticle of exposure Apparatus for detecting contaminants on the reticle of exposure

1983-01-06

1985-09-17

Willis, Davis L.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

250563, 250572, 355 53, G01N 2100

Patent

active

045417156

ABSTRACT:
An apparatus for detecting contaminants depositing on the reticle of a reduction projection mask aligner comprises a laser spot projector which conducts a laser beam to the light path upstream of the condenser lens of the aligner such that the laser beam is in the same direction as of the exposure light beam. The laser spot projector projects the laser beam from above the reticle through the condenser lens so as to form a laser spot on the upper surface of the reticle. A laser spot scanner which scans the entire area of the reticle by the laser spot projected on to the reticle by the laser spot projector, and a photoelectric detector which receives the scattered light emitted aslant on the reticle surface, whereby a contaminant on the reticle is detected in accordance with the signal produced by the detector.

REFERENCES:
patent: 4330205 (1982-05-01), Murakami et al.
patent: 4389084 (1983-06-01), Ban et al.
patent: 4443096 (1984-04-01), Johannsmeier et al.
patent: 4468120 (1984-08-01), Tanimoto et al.

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