Apparatus for detecting a mark pattern on a substrate

Optics: measuring and testing – By alignment in lateral direction

Patent

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Details

356401, 355 53, G01B 1100

Patent

active

057060916

ABSTRACT:
Illuminating light at a pupil plane of an illumination optical system for illuminating a position detection mark on a substrate is limited to an annular area centered at an optical axis, and a member substantially blocks an image-forming light beam distributed over an area on a pupil plane of an image-forming optical system for forming an image of the position detection mark on an imaging device by receiving light generated from the mark, the area being in image-forming relation to the annular area on the pupil plane of the illumination optical system. Alternatively, the image-forming light beam distributed over the area which is in image-forming relation to the annular area on the pupil plane of the illumination optical system and the image-forming light beam distributed over the area other than that area.

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