Apparatus for designing photomasks

Details Apparatus for designing photomasks Apparatus for designing photomasks

1996-05-31

1998-06-02

Trammell, James P.

Boots, shoes, and leggings

364489, 364490, 364491, 430 5, G06F 1500

Patent

active

057610754

ABSTRACT:
Method and apparatus for designing the photomask in the course of designing the Levenson-type phase shift mask, capable of automatically arranging the shifter, of not causing a contradictory spot in a circuit designing stage and of automatically forming a final layout achieving maximum integrity. The method includes the steps of: forming symbolic layout data in which a distance between adjacent clear areas is set to an arbitrary value; determining regions having a mutual phase difference 0.degree. or 180.degree. of light transmitting through adjacent patterns corresponding to the clear areas in the symbolic layout data; executing compaction of the symbolic layout in a manner that design rule S1 is adopted to the clear areas neighboring with the phase difference of 180.degree. and design rule S2 is adopted to the clear areas neighboring with the phase difference of 0.degree.; and forming mask layout data such that S1 is less than S2.

REFERENCES:
patent: 5298365 (1994-03-01), Okamoto et al.
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5358807 (1994-10-01), Okamoto
patent: 5362584 (1994-11-01), Brock et al.
patent: 5443931 (1995-08-01), Watanabe
patent: 5538815 (1996-07-01), Oi et al.
Hirai et al., "Augomatic Pattern Generation System For Phase Shifting Mask", Symposium On VLSI Technology Digest of Technical Papers, pp. 95-96, (1991).
Wong et al., "Investigating Phase-shifting Mask Layout Issues Using A CAD Toolkit", IEDM Technical Digest, pp. 705-708, (1991).
Moniwa et al., "Algorithm For Phase-Shift Mask Design With Prioirty On Shifter Placement", Jpn. J. Appl. Phys., vol. 32:5874-5879, (1993).

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