Apparatus for deriving an iso-dense bias

Optics: measuring and testing – Shape or surface configuration

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07639370

ABSTRACT:
Embodiments of an apparatus for deriving an iso-dense bias are generally described herein. Other embodiments may be described and claimed.

REFERENCES:
patent: 5164956 (1992-11-01), Lang
patent: 6785638 (2004-08-01), Niu et al.
patent: 6829056 (2004-12-01), Barnes et al.
patent: 6891626 (2005-05-01), Niu et al.
patent: 6943900 (2005-09-01), Niu et al.
patent: 7209798 (2007-04-01), Yamashita et al.
patent: 2002/0131055 (2002-09-01), Niu et al.
patent: 2004/0267397 (2004-12-01), Doddi et al.
patent: 2006/0064193 (2006-03-01), Yamashita et al.
patent: 2007/0233404 (2007-10-01), Lally et al.
patent: 2008/0076046 (2008-03-01), Willis et al.
U.S. Appl. No. 11/408,744, Nolet et al., “Optimized characterization of wafer structures for optical metrology”.
U.S. Appl. No. 11/848,214, Liu et al., “Automated process control using parameters determined with approximation and fine diffraction models”.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for deriving an iso-dense bias does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for deriving an iso-dense bias, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for deriving an iso-dense bias will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4136494

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.