Apparatus for depositing thin layers of materials by reactive sp

Details Apparatus for depositing thin layers of materials by reactive sp Apparatus for depositing thin layers of materials by reactive sp

1975-11-19

1977-09-27

Rimrodt, Louis K.

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

219121P, C23C 1312, B23K 500

Patent

active

040504085

ABSTRACT:
A method and apparatus for depositing thin layers of insulating or slightly conductive materials involves reactive spraying through high-frequency inductive plasma. The conductive component of the material to be deposited is sprayed in a first chamber through which an ionizable inert gas travels, the sprayed particles then passing through a second chamber in which a substrate is placed and to which a reactive gas is supplied.
Insulating and weakly inductive materials such as oxides, carbide and nitrides may be deposited at a rate substantially comparable with the rate for conductive materials to obtain high quality uniform deposits.

REFERENCES:
patent: 3010009 (1961-11-01), Ducati
patent: 3247014 (1966-04-01), Goldberger et al.
patent: 3690291 (1972-09-01), Judd et al.
patent: 3710070 (1973-01-01), Hirt et al.
patent: 3756193 (1973-09-01), Carmichael et al.
patent: 3839618 (1974-10-01), Muehlberger
patent: 4006340 (1977-02-01), Gorinas

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