Apparatus for depositing thin coats by vaporization under the si

Details Apparatus for depositing thin coats by vaporization under the si Apparatus for depositing thin coats by vaporization under the si

1975-02-24

1976-09-14

Kaplan, Morris

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

C23C 1312

Patent

active

039800440

ABSTRACT:
An apparatus for depositing thin coatings by vaporization onto substrates under the simultaneous action of an ionized gas comprises a gas chamber which is subdivided into first and second compartments which are connected to each other through a gas flow restrictor. The first compartment has a gas discharge electrode and has a connection to a supply line for the gas to be ionized. The second compartment contains a counterelectrode, an evaporator and means for holding the objects to be coated and is also connected to a pump to maintain a pressured gradient between the two compartments during vaporization.

REFERENCES:
patent: 2215787 (1940-09-01), Hailer
patent: 2820722 (1958-01-01), Fletcher
patent: 3208873 (1965-09-01), Ames et al.
patent: 3528387 (1970-09-01), Hamilton
patent: 3733258 (1973-05-01), Hanak et al.
patent: 3748169 (1973-07-01), Keller
patent: 3750623 (1973-08-01), Carpenter et al.

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