Apparatus for depositing materials on substrates

Details Apparatus for depositing materials on substrates Apparatus for depositing materials on substrates

1978-08-16

1980-12-02

Mack, John H.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

042369940

ABSTRACT:
A vapor deposition process which is carried out in a gaseous environment. The homogeneous nucleation of the vapor species in the gaseous environment is suppressed by heating the gaseous environment.

REFERENCES:
patent: 2691053 (1954-10-01), James et al.
patent: 3294669 (1966-12-01), Theuerer
patent: 3644191 (1972-02-01), Matsushima
patent: 3844924 (1974-10-01), Cunningham et al.
Substrate Heater for Sputtering System, Vacuum, vol. 29, No. 1, pp. 23-24.

Affiliated with

Also associated with

Rating

Apparatus for depositing materials on substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for depositing materials on substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for depositing materials on substrates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2282966