Apparatus for depositing dielectric films using a glow discharge

Details Apparatus for depositing dielectric films using a glow discharge Apparatus for depositing dielectric films using a glow discharge

1975-12-17

1978-01-03

Stein, Mervin

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

427 39, 427248B, C23C 1304

Patent

active

040660370

ABSTRACT:
Disclosed are apparatus for forming dense and tightly adhering dielectric films on the surface of conductors, semiconductors, and insulators. The apparatus includes a reaction chamber into which a gas is admitted, dispersed, and subjected to a radio frequency exciting field to form a highly luminous glow discharge zone within the chamber. Another gas is admitted separately and is dispersed downstream from the glow discharge zone, immediately above the substrate to be coated.

REFERENCES:
patent: 2884894 (1959-05-01), Ruppert et al.
patent: 3424661 (1969-01-01), Androshuk et al.
patent: 3460816 (1969-08-01), Miller
patent: 3655438 (1972-04-01), Sterling et al.
patent: 3757733 (1973-09-01), Reinberg
patent: 3847652 (1974-11-01), Fletcher et al.
patent: 3880112 (1975-04-01), Spitz et al.
Western Electric Company, Inc., Technical Digest No. 11, July 1968, pp. 5, 6, Apparatus for the Deposition of Silicon Nitride, R. A. Whitner.

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