Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-10-04
1996-10-22
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118728, 118729, 20429807, C23C 1600
Patent
active
055672426
ABSTRACT:
A method and apparatus for coating components such as cutting tools with diamond using a microwave plasma excited gas mixture in a reactor equipped with a bowl-shaped substrate table having a concave inner surface for supporting the components to be coated. The plasma forms a plasma ball during the coating operation and the geometrical shape, configuration and position of the table is adapted to stabilize the plasma and control the shape and position of the plasma in such a way that the outer surface of the plasma conforms substantially to the surfaces of the components to be coated. The table can include a system of channels for optimized gas flow and metallic or ceramic wires or rods to control the shape and position of the plasma as well as yield additional excitation of the gas mixture. The table can include an upper rim which facilitates coupling of the plasma directly to the table. The table can include ledges, rods, compartments and/or holes for supporting the components to be coated.
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Bunshah, R. F. Deposition Technologies for Films and Coatings, Noyes Publications 1982, p. 20.
Shahani Hamid
Sjostrand Mats
Soderberg Staffan
Breneman R. Bruce
Chang Joni Y.
Sandvik AB
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