Apparatus for depositing a substance on a rotating surface

Details Apparatus for depositing a substance on a rotating surface Apparatus for depositing a substance on a rotating surface

1995-05-11

1996-06-25

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723DC, 118724, 118730, C23C 1600, C23C 1650

Patent

active

055296335

ABSTRACT:
An apparatus for depositing a substance includes a rotating mandrel assembly with a mandrel having a deposition surface exposed to the vapor so that the substance is deposited on the deposition surface and having a base having a plurality of radiator fins extending therefrom. A plurality of receptor fins interleave with the radiator fins and provide heat exchange to the receptor fins to cool the mandrel during deposition of the substance on the deposition surface of the mandrel.

REFERENCES:
patent: 3845739 (1974-11-01), Erhart et al.
patent: 4471003 (1984-09-01), Cann
patent: 4487162 (1984-12-01), Cann
patent: 5063031 (1991-11-01), Sato
patent: 5108779 (1992-04-01), Gasworth
patent: 5204144 (1993-04-01), Cann et al.
patent: 5226383 (1993-07-01), Bhat

Affiliated with

Also associated with

Rating

Apparatus for depositing a substance on a rotating surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for depositing a substance on a rotating surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for depositing a substance on a rotating surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2186245