Apparatus for depositing a material on a substrate by chemical v

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of coating supply or source outside of primary...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427577, 427585, 4272481, 427249, 118715, 118723HC, 118724, C23C 1600

Patent

active

053188098

ABSTRACT:
Apparatus for the deposition of a material such as diamond on a substrate by chemical vapor deposition is provided. The apparatus comprises:

REFERENCES:
patent: 4953499 (1990-09-01), Anthony
patent: 4970986 (1990-11-01), Anthony
patent: 5007373 (1991-04-01), Legg
patent: 5160544 (1992-11-01), Garg

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for depositing a material on a substrate by chemical v does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for depositing a material on a substrate by chemical v, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for depositing a material on a substrate by chemical v will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-791621

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.