Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of coating supply or source outside of primary...
Patent
1992-11-04
1994-06-07
Bueker, Richard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of coating supply or source outside of primary...
427577, 427585, 4272481, 427249, 118715, 118723HC, 118724, C23C 1600
Patent
active
053188098
ABSTRACT:
Apparatus for the deposition of a material such as diamond on a substrate by chemical vapor deposition is provided. The apparatus comprises:
REFERENCES:
patent: 4953499 (1990-09-01), Anthony
patent: 4970986 (1990-11-01), Anthony
patent: 5007373 (1991-04-01), Legg
patent: 5160544 (1992-11-01), Garg
LandOfFree
Apparatus for depositing a material on a substrate by chemical v does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for depositing a material on a substrate by chemical v, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for depositing a material on a substrate by chemical v will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-791621