Fluid handling – Processes
Patent
1995-12-19
1998-06-09
Lee, Kevin
Fluid handling
Processes
137613, 137489, 251331, F16K 717, F16K 1702
Patent
active
057620865
ABSTRACT:
An apparatus free of polymer material in contact with process gas for delivering process gas for making semiconductors includes a pressure regulator for regulating the pressure of the process gas to be delivered by the apparatus from a supply of pressurized process gas. The pressure regulator has a first valve seat and a first valve which cooperates with the first valve seat for controlling the flow of process gas through the regulator. Both the first valve seat and the first valve are formed of metal. The apparatus further includes a second valve having metal-to-metal dynamic seating for controlling the flow of the gas from the supply to the regulator. The second valve is provided immediately upstream of the pressure regulator along a flow path for the gas through the apparatus. A relatively high creep of the pressure regulator is significantly reduced by operating the regulator in conjunction with the pneumatically operated (on/off) second valve.
REFERENCES:
patent: 4026513 (1977-05-01), Callenberg
patent: 4044794 (1977-08-01), Matthews
patent: 4828219 (1989-05-01), Ohmi et al.
patent: 4958658 (1990-09-01), Zajac
patent: 5687759 (1997-11-01), Tan
Lee Kevin
Veriflo Corporation
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