Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1976-02-27
1977-12-06
Prescott, Arthur C.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204180R, 204180G, G01N 2726
Patent
active
040615600
ABSTRACT:
In a procedure for performing a continuous, free-film deflection electropesis in which a narrow stream of a sample mixture is introduced into a thin strip of a buffer solution flowing through a separating chamber while an electric field is applied transversely to the flow direction, band broadening of the sample stream fractions is reduced by providing suitably selected values for the temperature gradient in the chamber and the wall zeta. Additional improvements are achieved by constructing the buffer solution flow path in the region of sample introduction in order to increase the buffer solution velocity thereat.
REFERENCES:
patent: 3412008 (1968-11-01), Strickler
patent: 3498905 (1970-03-01), Strickler
patent: 3655541 (1972-04-01), Strickler
patent: 3663395 (1972-05-01), Strickler
Hannig Kurt
Wirth Hanns
Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.v.
Prescott Arthur C.
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