Cutting – Other than completely through work thickness or through work... – Scoring
Reexamination Certificate
2011-08-09
2011-08-09
Lee, Laura M. (Department: 3724)
Cutting
Other than completely through work thickness or through work...
Scoring
C083S886000, C225S002000, C225S096500
Reexamination Certificate
active
07992482
ABSTRACT:
An apparatus for cutting a substrate includes first and second belt conveyers for conveying the substrate thereon, a scriber for scribing the substrate along a cutting-reserved line, the scriber provided between the first and second belt conveyers and being spaced apart from the first and second belt conveyers, and a substrate support for securing the substrate, the substrate support provided between the first and second belt conveyers along a scribing direction of the substrate.
REFERENCES:
patent: 4296662 (1981-10-01), Reed et al.
patent: 4694722 (1987-09-01), Collier et al.
patent: 5535933 (1996-07-01), Dickerson
patent: 6434974 (2002-08-01), Lisec
patent: 6557689 (2003-05-01), Gariglio
patent: 2007/0051769 (2007-03-01), Otoda et al.
patent: 1386606 (2002-12-01), None
patent: 1496798 (2004-05-01), None
patent: H03-236757 (1991-10-01), None
patent: H04-246618 (1992-09-01), None
patent: 9-278470 (1997-10-01), None
patent: H09-286628 (1997-11-01), None
patent: H09-289181 (1997-11-01), None
patent: 11322069 (1999-11-01), None
patent: 2002-233988 (2002-08-01), None
patent: 2004010466 (2004-01-01), None
patent: 2004026569 (2004-01-01), None
patent: 2004-066636 (2004-03-01), None
patent: 2004-224601 (2004-08-01), None
patent: 10-2004-0058160 (2004-07-01), None
Lee Laura M.
LG Display Co. Ltd.
McKenna Long & Aldridge LLP.
LandOfFree
Apparatus for cutting substrate and method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for cutting substrate and method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for cutting substrate and method thereof will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2665627