Apparatus for crystal growth

Coating apparatus – With heat exchange – drying – or non-coating gas or vapor... – With housing surrounding or engaging coating means

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118412, 118415, 118421, 118426, 156622, 148171, B01J 1704

Patent

active

040168298

ABSTRACT:
In order to eliminate non-uniformity in the temperature within the plane of a substrate that causes dispersions or variations in the characteristics of a grown layer during liquid phase epitaxial growth and to produce a grown layer having uniform characteristics, an apparatus for crystal growth according to the invention holds a substrate on a jig so that a flat surface of the substrate is arranged tangentially to an isothermal plane within the jig and aslant with respect to any position perpendicular or parallel to the axis or the center plane of the jig. Where a multiplicity of substrates are set, they are held on at least two flat surfaces which are tangential to an identical isothermal plane and which have different slopes.

REFERENCES:
patent: 3560276 (1971-02-01), Panish
patent: 3565702 (1971-02-01), Nelson
patent: 3598169 (1971-08-01), Copley
patent: 3631836 (1972-01-01), Jarvela
patent: 3647578 (1972-03-01), Barnett
patent: 3665888 (1972-05-01), Bergh
patent: 3692592 (1972-09-01), Marinelli
patent: 3741825 (1973-06-01), Lockwood
patent: 3762943 (1973-10-01), Winstel
patent: 3767481 (1973-10-01), Ettenberg
patent: 3783825 (1974-01-01), Koboyasi
patent: 3895765 (1975-07-01), Ariga
Blum et al., IBM Tech. Disclosure Bulletin, vol. 13, No. 11, Apr. 1971, p. 3221.

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