Apparatus for conveying and inspecting a substrate

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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356445, G01N 2186

Patent

active

047162996

ABSTRACT:
An arrangement in an apparatus for handling a substrate such as a photomask or a reticle used in a process of manufacturing a semiconductor device comprises a container unit for containing therein the substrate in a substantially horizontal posture, an inspection unit having means for inspecting a surface of the substrate, the inspecting means including a radiation source for supplying a directional beam, and a device for detecting the scattering of the directional beam, a holding member for supporting the substrate substantially horizontally, a device for moving the holding member between the container unit and the inspection unit and conveying the substrate from the container unit to the inspection unit by the use of the holding member, and a scanning device for moving the holding member in a horizontal direction relative to the inspecting means and moving the substrate relative to the directional beam while subjecting the surface of the substrate to the directional beam.

REFERENCES:
patent: 4422547 (1983-12-01), Abe et al.
patent: 4468120 (1984-08-01), Tanimoto et al.
patent: 4541715 (1985-09-01), Akiyama et al.
patent: 4568835 (1986-02-01), Inamura et al.
patent: 4598997 (1986-07-01), Steigmeier et al.
patent: 4610541 (1986-09-01), Tanimoto et al.

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