Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Patent
1987-12-14
1989-05-30
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
118715, 118724, 118726, C23C 1400
Patent
active
048340219
ABSTRACT:
An evaporated material distribution controller includes specially configured portions having shaped edges to maintain the ratio of the thickest and thinnest portions of the layer of material deposited onto a surface within a ratio between 1.5:1.00 and 1.00:1.00.
REFERENCES:
patent: 3904503 (1975-09-01), Hanfmann
patent: 4131753 (1978-12-01), Tsujimoto
patent: 4222345 (1980-09-01), Bergfelt
patent: 4380212 (1983-04-01), Kraus
patent: 4543910 (1985-10-01), Dobrowolski
Maissel et al., Handbook of Thin Film Tech., McGraw Hill, N.Y. .COPYRGT. 1970, pp. 1-64 and 1-65.
Opresko Stephen T.
Root Walter E.
Bueker Richard
Hallacher L. L.
Irlbeck D. H.
RCA Licensing Corporation
Whitacre E. M.
LandOfFree
Apparatus for controlling the distribution of evaporated materia does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for controlling the distribution of evaporated materia, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for controlling the distribution of evaporated materia will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2144511