Coating apparatus – Gas or vapor deposition – With treating means
Patent
1991-12-17
1993-07-27
Hearn, Brian E.
Coating apparatus
Gas or vapor deposition
With treating means
118715, 31511121, 333159, 333 99PL, C23C 1650
Patent
active
052307409
ABSTRACT:
A block of dielectric material having a long axis and a short axis and having low losses at a selected microwave frequency and a dielectric constant selected to produce a desired degree of phase modulation is mounted on a rotatable shaft in an orientation perpendicular to the long and short axes and arranged inside a waveguide feeding a CVD reactor containing a plasma species The block is spun by a rotational force applied to the shaft at an angular acceleration such that the two axes of the block successively intersect the axis of the waveguide within the decay period of the plasma species. The frequency of phase modulation can be varied by changing the angular acceleration of the shaft, and the amplitude of the phase modulation can be varied by changing the ratio of block length to thickness and/or by selecting a material with higher dielectric constant. The incident microwave power may be modulated as a function of angular position of the spin shaft. By moving the apparent plasma and modulating the applied microwave power, a customized temperature profile may be achieved over a desired substrate area.
REFERENCES:
patent: 2716221 (1955-08-01), Allen
patent: 4613836 (1986-09-01), Evans
patent: 4877509 (1989-10-01), Ogawa et al.
patent: 4909184 (1990-03-01), Fujiyama
Baskin Jonathan D.
Crystallume
D'Alessandro Kenneth
Hearn Brian E.
LandOfFree
Apparatus for controlling plasma size and position in plasma-act does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for controlling plasma size and position in plasma-act, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for controlling plasma size and position in plasma-act will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2339852