Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Patent
1996-01-22
1998-11-24
Garrett, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For crystallization from liquid or supercritical state
117217, 117218, 117900, C30B 3500
Patent
active
058401202
ABSTRACT:
An apparatus for producing a silicon single crystal grown by the Czochralski process. The apparatus includes a hollow growth chamber, a quartz crucible disposed within the growth chamber, and a pulling member for pulling a growing silicon single crystal upward from a silicon melt retained in the crucible. A crystal chamber above the growth chamber receives the crystal as it is pulled. A joining member joins the growth chamber and the crystal chamber. A first heating member defining a passageway through which the crystal is pulled, for preventing formation of oxygen precipitate nucleation centers in the crystal until the crystal has been pulled through the passageway, is disposed at least partially within the growth chamber. A second heating member defining a passageway through which the crystal is pulled, for controlling the formation of the oxygen precipitate nucleation centers in the crystal, is disposed within the crystal chamber.
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W. Bienert et al. "Performance Characteristics of Isothermal Furnace Liners" dynaTherm Corporation (Sep. 1984) 10 pages.
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Chandrasekhar Sadasivam
Kim Kyong-Min
Schrenker Richard G.
Shaw Roger W.
Garrett Felisa
MEMC Electronic Materials , Inc.
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