Patent
1992-07-02
1993-06-29
Rutledge, D.
354324, G03D 302
Patent
active
052238814
ABSTRACT:
An alkaline developing solution is used in development of photosensitive organic resin (photoresist) in liquid crystal board manufacturing process or printed board manufacturing process. The apparatus for controlling developing solution comprises developing solution discharge device for discharging developing solution by detecting the dissolved resin concentration in the developing solution by means of an absorption photometer (16), first replenishing device for replenishing undiluted developing solution and pure water by detecting the liquid level of the developing solution by means of a liquid level gauge (3), and second replenishing device for replenishing undiluted developing solution or pure water by detecting the alkali concentration of the developing solution by an electric conductivity meter (15). By thus constituting, the developing performance of the developing solution may be always kept constant, and the operation down time may be notably shortened.
REFERENCES:
patent: 5121164 (1992-06-01), Landa et al.
patent: 5168296 (1992-12-01), Nakamura et al.
Nakagawa Toshimoto
Ogawa Shu
Shiotsu Shinichiro
Tsukada Kouzo
Hirama Rika Kenkyujio Ltd.
Nagase & Co. Ltd.
Rutledge D.
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