Apparatus for controlling a plasma reaction

Details Apparatus for controlling a plasma reaction Apparatus for controlling a plasma reaction

1980-11-10

1982-11-02

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156626, 204298, 219121PF, 250573, 356316, C23C 1500, C23F 100

Patent

active

043571956

ABSTRACT:
An apparatus and method for controlling a plasma etching reaction. The plasma reaction is controlled by monitoring the output voltage of an optical detector which is responsive to emissions emanating from the reaction. As the output of the detector changes indicating that the first portion of the etching process has been completed, the average power density supplied to the reaction is reduced by switching the applied power from a continuous wave to a pulsed mode. The reaction is allowed to continue to completion in the reduced power mode.

REFERENCES:
patent: 3514604 (1970-05-01), Grojean
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4263089 (1981-04-01), Keller
patent: 4317698 (1982-03-01), Christol et al.
patent: 4332833 (1982-06-01), Aspnes et al.
Oshima "Optical . . . Control", Jap. J. of Applied Physics, vol 20, No. 4 (4/81), pp. 683-690.

Affiliated with

Also associated with

Rating

Apparatus for controlling a plasma reaction does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for controlling a plasma reaction, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for controlling a plasma reaction will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-623040