Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-02-02
1994-02-22
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118726, 118727, C23C 1424
Patent
active
052883280
ABSTRACT:
Source evaporation machine for covering samples optionally by a mixture produced by several sources (3).
Mobile covers (6) are placed between the sources (3) and the sample. The covers (6) are designed so as to ensure that the solid parts (23,24) and the openings (21,25) alternate and the sources (3) move relative to the covers in such a way that different circumferences of the covers pass in front of them. As the angular sectors surrounded by the openings differ for each circumference, the degree of hiding of the sources (3) can be regulated in a very accurate and reliable manner. It is possible to modify the flow of the source on the sample or, in the case of several sources, vary the composition of the deposited mixture.
REFERENCES:
patent: 3636916 (1972-01-01), Thelen et al.
Nouvelot Luc
Perrin Aime
Bueker Richard
Commissariat a l''Energie Atomique
Etat Francais Represente Par Le Delegue General Pour L'Armenent
LandOfFree
Apparatus for controlling a material flow emitted by a heated ev does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for controlling a material flow emitted by a heated ev, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for controlling a material flow emitted by a heated ev will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-168361