Apparatus for continuously producing potassium sulfate

Details Apparatus for continuously producing potassium sulfate Apparatus for continuously producing potassium sulfate

1980-07-07

1981-12-01

Chiesa, Richard L.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including heat exchanger for reaction chamber or reactants...

366149, 366309, 422210, 422225, 423552, F28G 310

Patent

active

043036198

ABSTRACT:
An improved apparatus for producing potassium sulfate and hydrogen chloride gas from potassium hydrogen sulfate and potassium chloride is provided, which comprises a horizontal type muffle furnace having an arcuate upper wall, at least one shaft of an agitator, a means for feeding raw materials, and a means for discharging the reaction product, to discharge the product by overflow; and an outer casing for said muffle furnace in which said furnace is accomodated on a bed of an insulating material and a space over said furnace, as a passage for heating gas. A heating gas introduced into said space over said furnace supplies the heat quantity required for the total reaction, through the upper wall of the furnace to raw materials. According to this apparatus, the life of furnace for continuous operation can be prolonged.

REFERENCES:
patent: 2623737 (1952-12-01), McEachran
patent: 3256066 (1966-06-01), Higgins
patent: 3473896 (1969-10-01), Halder et al.
patent: 3495951 (1970-02-01), Tanaka et al.
patent: 3592609 (1971-07-01), Honbo
patent: 3635682 (1972-01-01), Vine et al.
patent: 3782901 (1974-01-01), Whetstone

Affiliated with

Also associated with

Rating

Apparatus for continuously producing potassium sulfate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for continuously producing potassium sulfate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for continuously producing potassium sulfate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1296790