Apparatus for continuously forming a large area functional depos

Details Apparatus for continuously forming a large area functional depos Apparatus for continuously forming a large area functional depos

1991-11-27

1994-03-22

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

Running length work

118723ME, 118725, 118730, 118733, 156345, C23C 1654, C23C 1650

Patent

active

052960366

ABSTRACT:
In a method for continuously forming a large area functional deposit film comprising the steps of forming a column-shaped film deposition space with a strip type member being conveyed as the side walls thereof in the longitudinal direction of the strip type member on the way of its continuous conveyance, introducing deposit film formation material gas into the film deposition space through gas supplying means, generating microwave plasma in the film deposition space simultaneously by emitting microwave energy from the microwave applicator means which enables the emission of the microwave energy in the direction parallel to the progressing direction of the microwave, and forming such a deposit film on the surface of the strip type member to form the side walls which are exposed to the microwave plasma, the microwave applicator means is arranged either on one side or on both sides of the both end faces of the column-shaped film deposition space, a microwave transmitting member is arranged on the leading end portion of the microwave applicator means to separate it from the film deposition space airtightly and transmit the microwave energy emitted therefrom to the film deposition space through the microwave transmittable member which is adjacently coupled to the film deposition space and which is transferred from the film deposition space intermittently to an airtightly separable auxiliary chamber while maintaining the airtightness of the film deposition space, and the microwave transmittable member is replaced or a dry etching is performed in the auxiliary chamber.

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