Apparatus for continuously depositing a layer of a solid materia

Details Apparatus for continuously depositing a layer of a solid materia Apparatus for continuously depositing a layer of a solid materia

1982-12-14

1984-05-08

Smith, John D.

Coating apparatus

Gas or vapor deposition

Running length work

118725, 118729, 239422, 239433, B05B 700, C23C 1310

Patent

active

044468156

ABSTRACT:
The apparatus comprises a nozzle (2) having three converging tuyeres (3, 4, 5) which project the reagents (SnCl.sub.4 and H.sub.2 O) in the gaseous phase onto the substrate to be plated. Deflector members (6a, 6b), which are adapted to channel the gases between themselves and the substrate, extend on either side of the nozzle (2). The surface (51) of the deflector member (12) which extends in the opposite direction to the direction of movement of the substrate with respect to the nozzle is parallel to the substrate, and the edge (53) which it forms at an acute angle with the extended external wall (5b) of the third tuyere (5) is transversely offset in the direction of the said movement with respect to the axial median plane of the tuyere (3). On the other hand, the surface (52) of the second deflector member (5a) forms a blunt edge (54) with the corresponding longitudinal wall (4b) of the second tuyere. The opening of the nozzle between the edges (53, 54) is therefore effectively bent and the gases emerging therefrom are regularly deflected in the direction of movement of the substrate.

REFERENCES:
patent: 4088471 (1978-05-01), Kirkbride et al.
patent: 4123244 (1978-10-01), Leclercq et al.
patent: 4188199 (1980-02-01), Van Laethem et al.
patent: 4351267 (1982-09-01), Kalbskopf et al.
patent: 4361284 (1982-11-01), Kalbskopf et al.

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