Apparatus for continuous slag treatment of silicon

Metallurgical apparatus – Means for melting or vaporizing metal or treating liquefied... – With means to discharge molten material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C422S245100, C266S148000

Reexamination Certificate

active

10492220

ABSTRACT:
The invention relates to an apparatus for continuous slag treatment of molten silicon for removal of one a more impurity elements from the silicon, the apparatus comprising a vessel (1) intended to contain molten silicon and liquid slag. The vessel (1) has an upwardly extending overflow (4) for slag connected to an outlet opening (3) for slag is the bottom (2) of the vessel, a open-ended pipe (5) arranged about and at a distance from the overflow (4) such than there is an annulus between the pipe (5) and the overflow (4), which pipe (5) extends upwards to a level above the top of the overflow (4) and downwards to the bottom (2) of the vessel, the pipe (5) having at least one opening (6) at the bottom of the vessel (1) a closeable outlet opening (8,9) for treated silicon in the sidewall of the vessel, means (14) for supply of heat energy to the vessel, means for intermittent supply of solid or molten silicon to vessel and means for continuous of substantially continuous supply of solid or liquid slag to the top of the vessel.

REFERENCES:
patent: 4457903 (1984-07-01), Dietl et al.
patent: 5104096 (1992-04-01), Goins et al.
patent: 2004/0258588 (2004-12-01), Buseth et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for continuous slag treatment of silicon does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for continuous slag treatment of silicon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for continuous slag treatment of silicon will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3851231

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.