Apparatus for continuous processing of semiconductor wafers

Details Apparatus for continuous processing of semiconductor wafers Apparatus for continuous processing of semiconductor wafers

2005-05-31

2005-05-31

Mayekar, Kishor (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S212000, C204S22400M, C204S22400M, C204S623000

Reexamination Certificate

active

06899797

ABSTRACT:
An electrochemical reaction assembly of inducing electrochemical reactions, such as for deposition of materials on semiconductor substrates. The assembly achieves a highly uniform thickness and composition of deposition material or uniform etching or polishing on the semiconductor substrates by retaining the semiconductor substrates on a moving cathode immersed in an appropriate reaction solution wherein a wire mesh anode rotates about the moving cathode during electrochemical reaction.

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