Apparatus for continuous deposition by vacuum evaporation

Details Apparatus for continuous deposition by vacuum evaporation Apparatus for continuous deposition by vacuum evaporation

1982-03-26

1983-08-30

Smith, John D.

Coating apparatus

Gas or vapor deposition

Running length work

118726, 118715, C23C 1312

Patent

active

044010524

ABSTRACT:
An apparatus to deposit material on a substrate, such as in the making of thin solar cells, consists of two chambers. A manifold chamber having a plurality of spaces nozzles assures efficient and uniform deposition on a substrate. The rate of depositions is controlled by an orifice in a passageway connecting the manifold chamber to an evaporation chamber.

REFERENCES:
patent: 3325628 (1967-06-01), Valley et al.
patent: 3894164 (1975-07-01), Dismukes et al.
patent: 4063974 (1977-12-01), Fraas
patent: 4286545 (1981-09-01), Takagi et al.

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