Apparatus for continuous deposition by vacuum evaporation

Coating apparatus – Gas or vapor deposition – Running length work

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118726, 118715, C23C 1312

Patent

active

044010524

ABSTRACT:
An apparatus to deposit material on a substrate, such as in the making of thin solar cells, consists of two chambers. A manifold chamber having a plurality of spaces nozzles assures efficient and uniform deposition on a substrate. The rate of depositions is controlled by an orifice in a passageway connecting the manifold chamber to an evaporation chamber.

REFERENCES:
patent: 3325628 (1967-06-01), Valley et al.
patent: 3894164 (1975-07-01), Dismukes et al.
patent: 4063974 (1977-12-01), Fraas
patent: 4286545 (1981-09-01), Takagi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for continuous deposition by vacuum evaporation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for continuous deposition by vacuum evaporation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for continuous deposition by vacuum evaporation will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-901732

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.