Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Coating
Reexamination Certificate
2006-07-11
2006-07-11
McDonald, Rodney G. (Department: 1753)
Superconductor technology: apparatus, material, process
Processes of producing or treating high temperature...
Coating
C505S476000, C505S477000, C505S473000, C204S192240, C204S192120, C427S255240, C427S501000, C427S513000, C427S538000, C427S171000, C427S172000, C427S175000, C427S177000, C427S178000
Reexamination Certificate
active
07074744
ABSTRACT:
A method of coating a substrate for a high temperature superconductor material is disclosed, including loading a substrate into a first deposition chamber, routing the substrate in the first deposition chamber such that the substrate forms a helical winding in the first deposition chamber, and depositing a first buffer layer to overlie the substrate as the substrate translates along the helical winding. The buffer layer has a biaxial crystallographic texture.
REFERENCES:
patent: 3829373 (1974-08-01), Kuehnle
patent: 3884787 (1975-05-01), Kuehnle
patent: 4562093 (1985-12-01), Mario et al.
patent: 4763601 (1988-08-01), Saida et al.
patent: 5968877 (1999-10-01), Budai et al.
patent: 6673387 (2004-01-01), Zhang et al.
patent: 6906008 (2005-06-01), Selvamanickam et al.
Savvides, et al., “High Jc YBCO Conductors Fabricated by Magnetron Deposition”, Mat. Res. Soc. Symp. Proc., vol. 616, pp. 199-204: 2000.
Arendt, et al., “YBCO/YSZ Coated conductors on Flexible Ni Alloy Substrates”, Appl. Supercond., vol. 4, pp. 429-434, 1998.
Sathiraju Srinivas
Selvamanickam Venkat
Larson Newman Abel Polansky & White LLP
SuperPower Inc.
LandOfFree
Apparatus for consecutive deposition of high-temperature... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for consecutive deposition of high-temperature..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for consecutive deposition of high-temperature... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3565805