Apparatus for consecutive deposition of high-temperature...

Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Process of making wire – tape – cable – coil – or fiber

Reexamination Certificate

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C505S473000, C505S475000, C505S476000, C505S477000, C204S192120, C204S192240, C204S298240, C427S255500, C427S251000, C427S501000, C427S513000, C427S538000, C427S171000, C427S172000, C427S175000, C427S177000, C427S178000, C118S718000, C118S033000

Reexamination Certificate

active

06906008

ABSTRACT:
The present invention is a deposition system for the production of coated substrates that provides a first deposition process that subsequently feeds a second deposition process and where the two deposition processes are occurring concurrently. The consecutive deposition system includes two dynamically isolated deposition chambers. The substrate is helically wrapped about a cooling block within the first deposition chamber such that the tape is exposed to a deposition zone a number of times sufficient to correspond to the desired film thickness. A shielding element may be included in the second deposition chamber to limit the size of the second chamber deposition zone and thus the film thickness of the second coating layer.

REFERENCES:
patent: 3829373 (1974-08-01), Kuehnle
patent: 3884787 (1975-05-01), Kuehnle
patent: 4562093 (1985-12-01), Mario et al.
patent: 4763601 (1988-08-01), Saida et al.
patent: 5968877 (1999-10-01), Budai et al.
patent: 6673387 (2004-01-01), Zhang et al.
Savvides, et al., “High Jc YBCO Conductors Fabricated By Magnetron Deposition”, Mat. Res. Soc. Symp. Proc., vol. 616, pp. 199-204: 2000.
Arendt, et al., “YBCO/YSZ Coated Conductors on Flexible NI Alloy Substrates”, Appl. Supercond. vol. 4, pp. 429-434, 1998.

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