Apparatus for coating substrates with inductively charged resino

Coating apparatus – With means to apply electrical and/or radiant energy to work... – Electrostatic and/or electromagnetic attraction or...

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118629, 118308, 2396901, 427459, 427461, 427475, 427483, 427541, 427195, 427314, B05B 500

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active

055185460

ABSTRACT:
An apparatus for improving the electrostatic charge developed on a resin powder composition for electrostatic coating of solid objects and the method of application thereof. The apparatus comprises a device for charging the powder by electrical induction/conduction such that the powder particles have a resistivity of from about 10.sup.9 to about 10.sup.13 ohm.meters at 20 percent relative humidity and spraying the charged powder onto an grounded solid object to which it adheres prior to the thermal fusing to produce a permanent finish.

REFERENCES:
patent: 3617000 (1971-11-01), Probst et al.
patent: 3637135 (1972-01-01), Luderer et al.
patent: 3735925 (1973-05-01), Benedik et al.
patent: 3865079 (1975-02-01), Kellams et al.
patent: 3951340 (1976-04-01), Point
patent: 4073265 (1978-02-01), Walling et al.
patent: 4104416 (1978-08-01), Parthasarathy et al.
patent: 4381728 (1983-05-01), Walling et al.
patent: 4500560 (1985-02-01), Guffroy
patent: 5075257 (1991-12-01), Hawk et al.
patent: 5351903 (1994-10-01), Mazakas et al.

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