Apparatus for coating substrates, preferably flat, more or less

Details Apparatus for coating substrates, preferably flat, more or less Apparatus for coating substrates, preferably flat, more or less

1992-04-06

1994-01-04

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429835, 118719, 414217, C23C 1434

Patent

active

052757099

ABSTRACT:
Apparatus for coating substrates by a vacuum coating process. The apparatus includes a plurality of closed processing chambers, each provided with an entrance/exit closable opening. The individual processing chambers have an approximately equal configuration in groups and are disposed one above the other. The chambers have planes in each case at the same distance from a level on which the apparatus is set up. The individual chambers have entrance/exit closable openings. A common elevator chamber has a substrate lift by which the substrates can be moved vertically from the plane of one processing chamber to the plane of another processing chamber. The entrance/exit closable openings lead all to the common elevator chamber. At least one of the chambers of a group has an entrance/exit airlock chamber and is provided with an entrance/exit airlock opening which forms a connection to space surrounding the apparatus.

REFERENCES:
patent: 4550239 (1985-10-01), Uehara et al.
patent: 4825808 (1989-05-01), Takahashi et al.

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