Apparatus for coating substrates in a vacuum

Details Apparatus for coating substrates in a vacuum Apparatus for coating substrates in a vacuum

1996-08-01

1998-09-15

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, C23C 1434

Patent

active

058074708

ABSTRACT:
An alternating-current source (2) is connected to two cathodes (6,7) which cooperate electrically with targets which are sputtered in a gas discharge while a process gas is introduced in a vacuum chamber (15). A network formed of a transformer (3) and additional coils (5, 12, 13) and condensers (4, 8, 9, 10, 11) acts as a filter to assure a stable coating process.

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patent: 5082546 (1992-01-01), Szczyrbowski et al.
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patent: 5240584 (1993-08-01), Szczyrbowski et al.
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patent: 5399252 (1995-03-01), Scherer et al.
patent: 5415757 (1995-05-01), Szczyrbowski et al.
patent: 5512164 (1996-04-01), Timberlake

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