Apparatus for coating substrates especially with magnetizable ma

Details Apparatus for coating substrates especially with magnetizable ma Apparatus for coating substrates especially with magnetizable ma

1997-10-29

1999-07-13

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429828, 20429816, 20429811, 20429806, 20419212, C23C 1434

Patent

active

059221828

ABSTRACT:
In an apparatus for coating substrates (9), especially with magnetizable materials such as NiFe, with a circular, disk-shaped, rotatably supported substrate holder (3), which is subjected to an HF bias voltage, which is provided around its circumference and on the back with dark-space shield (1), and which rotates under at least one opposing cathode (7), and with a device for generating a magnetic field (13) parallel to the plane of the substrate (9), the magnetic field is generated by an electromagnet, the exciter coil of which, together with the lower part of the yoke (10), is housed in the dark-space shield (1), whereas the extended pole pieces (12, 12'), which are electrically insulated from the coil yoke (10) via the dark space gap (2), are housed in the substrate holder (3) in proximity to the substrate (9).

REFERENCES:
patent: 4581118 (1986-04-01), Class et al.
patent: 4865709 (1989-09-01), Nakagawa et al.
patent: 5334298 (1994-08-01), Gegenwart
patent: 5423971 (1995-06-01), Arnold et al.
patent: 5538610 (1996-07-01), Gesche et al.
patent: 5630916 (1997-05-01), Gerrish et al.
patent: 5795448 (1998-08-01), Hurwitt et al.
patent: 5804041 (1998-09-01), Hurwitt
Patent Abstracts of Japan C-846, Jul. 2, 1991, vol. 15, No. 259.

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