Apparatus for coating substrates by plasma polymerization

Details Apparatus for coating substrates by plasma polymerization Apparatus for coating substrates by plasma polymerization

1985-05-21

1986-12-23

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118724, 118729, 118733, 118 501, C23C 1600

Patent

active

046305688

ABSTRACT:
Apparatus for coating substrates by means of a reaction for depositing atoms or molecules which is initiated by a plasma. A reaction chamber (1) is equipped with at least one window (22, 23), penetrable by microwaves, with at least one wave-guide structure (16, 17), arranged outside the chamber (1) and in front of the window (22, 23), and with a distributing means (25) discharging into the chamber.
According to the invention and for the purpose of achieving the object of facilitating inspection and repairs, the window (22, 23) penetrable by microwaves, the one or more wave-guide structures (16, 17) and the distributing means (25) are all secured in or on a support frame (10), which can be removed, or swung away, from the reaction chamber (1) as a single unit.

REFERENCES:
patent: 4217856 (1980-08-01), Kraus
patent: 4316430 (1982-02-01), Jolly et al.
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4423701 (1984-01-01), Nath et al.

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