Apparatus for coating substrates

Details Apparatus for coating substrates Apparatus for coating substrates

1987-12-17

1989-04-25

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118719, 118723, C23C 1456

Patent

active

048245453

ABSTRACT:
An apparatus for coating substrates in a vacuum chamber has a cathode system, which is preceded and followed by evacuable isolating chambers. The individual chambers can be separated from one another by locks, and the apparatus has a conduit leading into the coating chamber for feeding one or more process gases. Transport frames carry the substrates through the individual chambers on rails and/or wheels. In such an apparatus one or more bypass lines are provided which connect the coating chamber to the isolating chambers preceding or following it, and a shutoff or valve is inserted into each bypass line and brings about an equalization of pressure between the chambers. By means of a pressure equalization performed in this manner, the constancy of the gas concentrations which is essential in a reactive process to the stability of the process and to uniform coating properties, is automatically assured.

REFERENCES:
patent: 3822200 (1974-07-01), Endo

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