Apparatus for coating photoresist material

Details Apparatus for coating photoresist material Apparatus for coating photoresist material

2006-04-07

2010-06-08

Tadesse, Yewebdar T (Department: 1792)

Coating apparatus

Projection or spray type

With projector heating, cleaning or conditioning

C118S326000, C118S323000, C118S052000, C118S602000, C239S106000

Reexamination Certificate

active

07730849

ABSTRACT:
An apparatus for providing a photoresist material onto a substrate includes a lid housing at least one nozzle. A solvent supplying port inputs the solvent into the apparatus. A first solvent trap is provided below the nozzle and coupled to the solvent supplying port to hold a given amount of the solvent being input from the solvent supplying port. The first solvent trap is configured to prevent photoresist residues on the nozzle from being converted to powders. A second solvent trap is provided below the first solvent trap to receive the solvent from the first solvent trap. A solvent path is provided between the solvent trap and the solvent container to guide the solvent from the first solvent trap to the second solvent trap.

REFERENCES:
patent: 7153364 (2006-12-01), Rangarajan et al.
patent: 2005/0188919 (2005-09-01), Nguyen
patent: 2000164491 (2000-06-01), None

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