Apparatus for coating photoresist having slit nozzle

Details Apparatus for coating photoresist having slit nozzle Apparatus for coating photoresist having slit nozzle

2005-03-30

2008-11-18

Tadesse, Yewebdar T (Department: 1792)

Coating apparatus

Projection or spray type

Moving projector

C118S421000, C239S568000

Reexamination Certificate

active

07452422

ABSTRACT:
An apparatus for coating a photoresist onto a substrate includes a slit nozzle to apply the photoresist to the substrate, a slit nozzle driving unit to move the slit nozzle, and a photoresist supply unit connected to the slit nozzle to supply the photoresist to the slit nozzle.

REFERENCES:
patent: 4949905 (1990-08-01), Jones et al.
patent: 5776545 (1998-07-01), Yoshiba et al.
patent: 5976256 (1999-11-01), Kawano
patent: 6692165 (2004-02-01), Tanaka et al.
patent: 19821612 (1999-11-01), None
patent: 05032471 (1993-02-01), None
patent: 2001347211 (2001-12-01), None
patent: 2004281645 (2004-10-01), None
English Translated Abstract JP 2004281645A.
English Translated Abstract JP 2001347211A.
English Translated Abstract of DE19821612A1.
English translated Abstract JP-05032471.

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