Coating apparatus – With means to centrifuge work
Reexamination Certificate
2006-03-07
2006-03-07
Fiorilla, Chris (Department: 1734)
Coating apparatus
With means to centrifuge work
C118S612000, C118S319000, C118S320000
Reexamination Certificate
active
07008480
ABSTRACT:
Disclosed is a photoresist coating apparatus capable of preventing a substrate from being contaminated and preventing a pattern bridge phenomenon from being created in the substrate during an exposure process by shielding backflow of photoresist through forcibly exhausting photoresist to an exterior. The photoresist coating apparatus includes a vacuum chuck for holding a substrate by using vacuum, a driving motor connected to the vacuum chuck through an arm, a first nozzle for coating photoresist onto the substrate, a second nozzle for performing a rinse process, a bath surrounding the vacuum chuck to prevent photoresist from being discharged to an exterior, a first drain pipe connected to both lower ends of the bath in order to discharge photoresist contained in the bath, and a photoresist discharge section for forcibly discharging photoresist contained in the bath to the exterior.
REFERENCES:
patent: 3389682 (1968-06-01), Gardner
patent: 4894260 (1990-01-01), Kumasaka et al.
patent: 5678116 (1997-10-01), Sugimoto et al.
patent: 6284044 (2001-09-01), Sakamoto et al.
patent: 6689419 (2004-02-01), Itou
patent: 6743722 (2004-06-01), Kassir
patent: 2003/0209259 (2003-11-01), Tung et al.
patent: 2004/0060582 (2004-04-01), Sasaki et al.
Fiorilla Chris
Hynix / Semiconductor Inc.
Ladas & Parry LLP
Tadesse Yewebdar
LandOfFree
Apparatus for coating photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for coating photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for coating photoresist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3556759